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** Alignment ODPs | ** Alignment ODPs | ||
* Patterns must be fully annotated, using the templates provided in the portal for each category. | * Patterns must be fully annotated, using the templates provided in the portal for each category. | ||
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'''Process''' | '''Process''' | ||
* Each submission will be reviewed by at least two members of the PC or the ODP portal Quality Committee (in case of disagreement a third reviewer will be assigned) | * Each submission will be reviewed by at least two members of the PC or the ODP portal Quality Committee (in case of disagreement a third reviewer will be assigned) | ||
* The final decision will be made by the pattern chairs, based on the reviews. | * The final decision will be made by the pattern chairs, based on the reviews. | ||
− | * The following criteria will be specifically | + | * The following criteria will be specifically taken into consideration: |
− | ** | + | ** the practical utility and reusability of the pattern by a community, |
− | ** | + | ** the relevance of the problem addressed by the pattern, |
− | ** | + | ** if the pattern encodes some best practice within a community, |
− | ** ... | + | ** and whether the pattern presents a problem suitable for discussion and the workshop. |
− | * Accepted patterns will be assigned an advisor (a member of the PC or the ODP Quality | + | * When a pattern is accepted the authors are also required to describe the pattern in an extended abstract (formatting instructions - see regular papers), of maximum 4 pages. The extended abstract must be submitted before the camera ready deadline of papers, and will be included in the online proceedings. |
− | * At least one pattern author must register for, and attend, the workshop to present and discuss the pattern | + | * Accepted patterns will be assigned an advisor (a member of the PC or the ODP Quality Committee) who will discuss the reviews and the pattern with the author, and assist the revision of the pattern by proposing necessary changes and updates before the final upload (deadline see below). |
− | * At the workshop each pattern will be given a time slot for discussion | + | * At least one pattern author must register for, and attend, the workshop to present and discuss the pattern. |
− | ** | + | * At the workshop each pattern will be given a time slot for discussion, including the following parts: |
− | ** | + | ** A brief presentation of the pattern by the author. |
− | ** The audience participates in the discussion and specific focus is given to improvements | + | ** An overview of the discussion (reviews and subsequent updates), presented by the advisor, who also indicates main points of interest, main merits and weaknesses of the pattern, and initiates the discussion with the author. |
− | * After the workshop the author is | + | ** The audience participates in the discussion and specific focus is given to possible improvements to the pattern. |
+ | * After the workshop the author is given a second opportunity to improve the pattern, thereafter the advisor may make the decision to certify the pattern for inclusion in the ODP official catalogue. | ||
We invite the submission of original research results related to the focus areas of the workshop. Research papers should present mature work and document established results. Poster papers may present work-in-progress, presentations of implemented systems, preliminary results of issues still under development, and other kinds of results suitable presentation in a poster format.
Submission guidelines
Process
Important dates for paper and poster submission
We invite the submission of research results in the form of ontology design patterns (ODPs). Patterns submitted should have a general relevance to the ontology engineering field, or specific interest within a knowledge domain. Patterns should solve some particular problem, and be of significant interest for discussion at the workshop. Patterns should be original, in the sense that they are the intellectual product of the author, however they may still be based on the collective experience of a community.
Submission guidelines
Process
Important dates for pattern submission