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Accepted pattern descriptions will also be included in the post-workshop proceedings which will appear in the IOS Press/AKA book series [http://www.semantic-web-studies.net/publications.htm Studies on the Semantic Web]. | Accepted pattern descriptions will also be included in the post-workshop proceedings which will appear in the IOS Press/AKA book series [http://www.semantic-web-studies.net/publications.htm Studies on the Semantic Web]. | ||
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This page contains instructions for submitting to WOP 2017. There are two main categories of papers:
We invite the submission of original research results related to the focus areas of the workshop. Research papers (maximum 15 pages LNCS style) should present mature work and document established results, or be short papers presenting proposed research directions and novel ideas (maximum 5 pages LNCS style).
Submission guidelines
Review process and publication
Each paper will be reviewed by at least two reviewers, final accept/reject decisions are made by the chairs based on these reviews. Acceptance is conditional, meaning that only accepted papers that perform the changes requested by the reviewers (this will be checked carefully by the chairs) and where at least one author registers for the workshop, will be included in the proceedings and in the workshop program. These papers will be made available online from the workshop webpage. Please note that ISWC usually do NOT allow "workshop-only" registrations, i.e. registering for the workshop will therefore mean to register for the main conference + WOP.
We will also publish post-workshop proceedings with (possibly extended) accepted papers, in the IOS Press/AKA book series Studies on the Semantic Web.
Instructions for accepted papers, presentations, and post-proceedings will be provided later.
We invite the submission of new Ontology Design Patterns. Submissions will be composed of a pattern and a short paper (between 5 and 12 pages in LNCS style) describing it.
The following is a list of detailed instructions that authors have to take into account in order to submit their patterns:
Review Process
Each submission will be reviewed by at least two members of the Pattern PC (in case of disagreement a third reviewer will be assigned). Note that all reviews and discussions of patterns done in ODP portal are public and not anonymous, hence, all visitors of the portal can see the reviews and any subsequent discussion. Your pattern will be reviewed based on the following set of criteria:
Accepted patterns have to be improved based on the review comments, i.e., an update of the patterns in the ODP portal is mandatory. Accepted patterns will be presented at the workshop as posters in the pattern session. After the workshop, the patterns may be considered for certification in the ODP portal.
Accepted pattern descriptions will also be included in the post-workshop proceedings which will appear in the IOS Press/AKA book series Studies on the Semantic Web.