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What is your main motivation for joining the ODP community?info.pngThis is a property of type Text. :
I am actively developing design patterns for my own work, e.g. Rinke Hoekstra. Ontology Representation - Design Patterns and Ontologies that Make Sense, volume 197 of Frontiers of Artificial Intelligence and Applications. IOS Press, Amsterdam, June 2009. Rinke Hoekstra. BestMap: Context-aware SKOS vocabulary mappings in OWL 2. In Proceedings of OWL: Experiences and Directions (OWLED 2009), 2009. Technical Paper. Rinke Hoekstra and Joost Breuker. Polishing diamonds in OWL2. In Aldo Gangemi and Jérôme Euzenat, editors, Proceedings of the 16th International Conference on Knowledge Engineering and Knowledge Management (EKAW 2008), LNAI/LNCS. Springer Verlag, October 2008.
To have some help to solve modeling problems To help other users to solve modeling problems
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conference/public events friends colleagues surfing the web
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