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== Pattern Submission == | == Pattern Submission == | ||
+ | We invite the submission of new Ontology Design Patterns. Submissions will be composed of a pattern and a short paper (maximum 4 pages in LNCS style) describing it. | ||
− | + | The following is a list of detailed instructions that authors have to take into account in order to submit their patterns: | |
− | + | ||
* [[Special:RequestAccount | Request an account at the ODP portal]], in case you do not have already one. Note that account requests are processed by hand, so do this step with a few days to spare before the submission deadline. | * [[Special:RequestAccount | Request an account at the ODP portal]], in case you do not have already one. Note that account requests are processed by hand, so do this step with a few days to spare before the submission deadline. | ||
* Go to the ODP portal [[Submissions:SubmitAPattern | pattern submission page]]. | * Go to the ODP portal [[Submissions:SubmitAPattern | pattern submission page]]. | ||
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* If you are experiencing any problems, or have questions about how to submit patterns, please contact the chairs. | * If you are experiencing any problems, or have questions about how to submit patterns, please contact the chairs. | ||
− | ''' | + | ==== Review Process ==== |
+ | |||
+ | Each submission will be reviewed by at least two members of the Pattern PC (in case of disagreement a third reviewer will be assigned). Note that all reviews and discussions of patterns done in [[Ontology_Design_Patterns_._org_(ODP) | ODP portal]] are '''public''' and '''not''' anonymous, hence, all visitors of the portal can see the reviews and any subsequent discussion. Your pattern will be reviewed based on the following set of criteria: | ||
− | + | * the practical utility and reusability of the pattern by a community, | |
+ | * the relevance of the problem addressed by the pattern, | ||
+ | * if the pattern encodes some best practice within a community, | ||
+ | * and the completeness and clarity of the pattern submission, i.e., if all fields have been filled and all aspects properly explained. | ||
− | + | Accepted patterns have to be improved based on the review comments, i.e., an update of the patterns in the ODP portal is mandatory. Accepted patterns will be presented at the workshop as posters in the pattern session. After the workshop, the patterns may be considered for certification in the ODP portal. | |
== Pattern Submissions == | == Pattern Submissions == | ||
'''TO BE WRITTEN''' | '''TO BE WRITTEN''' |
Very preliminary page
This page contains instructions for submitting to WOP 2016. Submission will be possible in the following two categories - in both cases the submission deadlines are TO BE ANNOUNCED for the abstract (required!), and TO BE ANNOUNCED for the full research/pattern paper; both are at 11:59 PM Hawaii time:
We invite the submission of original research results related to the focus areas of the workshop. Research papers (maximum 12 pages LNCS style) should present mature work and document established results, or be short papers presenting proposed research directions and novel ideas (maximum 4 pages LNCS style).
Submission guidelines
We invite the submission of new Ontology Design Patterns. Submissions will be composed of a pattern and a short paper (maximum 4 pages in LNCS style) describing it.
The following is a list of detailed instructions that authors have to take into account in order to submit their patterns:
Each submission will be reviewed by at least two members of the Pattern PC (in case of disagreement a third reviewer will be assigned). Note that all reviews and discussions of patterns done in ODP portal are public and not anonymous, hence, all visitors of the portal can see the reviews and any subsequent discussion. Your pattern will be reviewed based on the following set of criteria:
Accepted patterns have to be improved based on the review comments, i.e., an update of the patterns in the ODP portal is mandatory. Accepted patterns will be presented at the workshop as posters in the pattern session. After the workshop, the patterns may be considered for certification in the ODP portal.
TO BE WRITTEN